AM0092: Substitution of PFC gases for cleaning Chemical Vapour Deposition (CVD) reactors in the semiconductor industry --- Version 1.0.0

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Title Substitution of PFC gases for cleaning Chemical Vapour Deposition (CVD) reactors in the semiconductor industry (663 KB)

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Version number
1.0.0
Scale Large scale
Status Not Active (old version)
Validity Valid from 15 Jul 11 to 22 Nov 12
Sectoral scope(s) 4, 11
Approval history NM0330
Clarifications* Clarification of the application of equation 2 in the methodology (submitted 24 Sep 12): AM_CLA_0239 (166 KB)

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