04:34 09 Apr 25
AM0092:
Substitution of PFC gases for cleaning Chemical Vapour Deposition (CVD) reactors in the semiconductor industry --- Version 1.0.0
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Version number |
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Scale | Large scale | |
Status | Not Active (old version) | |
Validity |
Valid from 15 Jul 11 to 22 Nov 12
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Sectoral scope(s) | 4, 11 | |
Approval history | NM0330 | |
Clarifications* |
Clarification of the application of equation 2 in the methodology
(submitted 24 Sep 12):
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* Only the requests for clarification and revision that have been clarified by the Meth Panel are displayed. To view all requests for clarification, go to this page. To view all requests for revision, go to this page.
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