NM0330: Substitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industry

Initial submission

Reference	NM0330
Title	Substitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industry
Submitted	by DNV on 22 Dec 09
Documents	Scanned NM form (302 KB) PDD - PDF version (886 KB) New baseline and Monitoring Methodology - PDF version (901 KB) PP response to MPs comments on NM0317 (49 KB)
Current status	18 Jul 11 - Submission approved
Historic statuses	22 Dec 09 - Submission received 22 Dec 09 - Undergoing Assessment by the Secretariat 11 Jan 10 - Successfully passed the Completeness Check 24 Mar 10 - Submission fee received 24 Mar 10 - Submission deemed qualified 25 Mar 10 - Opened for public comments 18 Apr 10 - Closed for public comments 11 Nov 10 - Awaiting Project Participant feedback on the preliminary recommendation 21 Jan 11 - Clarifications received from project participants 11 Mar 11 - Work in Progress (Meth Panel 48) 06 May 11 - Work in Progress (Meth Panel 49) 11 Jul 11 - Meth Panel recommendation issued (A)

Project participants

• Kevin James

Call for public input

From 25 Mar 2010 (00:00:00 GMT) till 17 Apr 2010 (23:59:59 GMT).

Desk review(s)

There are no desk reviews.

Output of subsequent Panel meetings

Meth Panel 50	Draft reformatted methodology (623 KB) Final recommendation (173 KB) Summary recommendation (173 KB)
Meth Panel 49	Work in progress: see para 1 (a) of MP49:10. The panel requested the Board to take note that it could not conclude its consideration of the following proposed new methodologies: (a) NM0330 ìSubstitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industryî, due to the high workload. The panel will continue its consideration of the proposed new methodology at its next meeting;
Meth Panel 48	Work in progress: MP49 report: 10. The panel requested the Board to take note that it could not conclude its consideration of the following proposed new methodologies: (a) NM0330 ìSubstitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industryî, due to the high workload. The panel will continue its consideration of the proposed new methodology at its next meeting;
Meth Panel 46	Preliminary recommendation (1182 KB) Feedback to preliminary recommendation (1201 KB)

Output of subsequent EB meetings

EB 62	A (113 KB)