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Title	Substitution of PFC gases for cleaning Chemical Vapour Deposition (CVD) reactors in the semiconductor industry (1045 KB) Word version (445 KB) View AM0092 summary in the CDM Methodology Booklet Tools referenced in this methodology: Combined tool to identify the baseline scenario and demonstrate additionality (440 KB) Tool to determine the remaining lifetime of equipment (218 KB) Assessment of the validity of the original/current baseline and update of the baseline at the renewal of the crediting period (187 KB)
Version number	2.0.0
Scale	Large scale
Status	Active
Validity	Valid from 23 Nov 12 onwards
Sectoral scope(s)	4, 11
Approval history	NM0330
Previous Versions
Title	Substitution of PFC gases for cleaning Chemical Vapour Deposition (CVD) reactors in the semiconductor industry --- Version 1 (663 KB)
Version number	1.0.0
Validity	Valid from 15 Jul 11 to 22 Nov 12 Requests for registration can be submitted until 23 Jul 2013 23:59:59 GMT
Sectoral scope(s)	4, 11
Clarifications*	Clarification of the application of equation 2 in the methodology (submitted 24 Sep 12): AM_CLA_0239 (166 KB)
Approval history	NM0330

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