NM0332: PFCs emission reduction from installation of an abatement device in a semiconductor manufacturing facility

Initial submission

Reference	NM0332
Title	PFCs emission reduction from installation of an abatement device in a semiconductor manufacturing facility
Submitted	by KEA on 26 Jan 10
Documents	Scanned NM form (23 KB) PDD - PDF version (502 KB) New baseline and Monitoring Methodology - PDF version (463 KB) Annex I (64 KB)
Current status	30 Sep 11 - Submission approved
Historic statuses	26 Jan 10 - Submission received 02 Mar 10 - Undergoing Assessment by the Secretariat 09 Mar 10 - Successfully passed the Completeness Check 24 Mar 10 - Submission fee received 24 Mar 10 - Submission deemed qualified 25 Mar 10 - Opened for public comments 18 Apr 10 - Closed for public comments 10 Aug 10 - Awaiting the Meth Panel recommendation 21 Mar 11 - Awaiting Project Participant feedback on the preliminary recommendation 12 Apr 11 - Clarifications received from project participants 06 May 11 - Work in Progress (Meth Panel 49) 01 Jul 11 - Work in Progress (Meth Panel 50) 05 Sep 11 - Meth Panel recommendation issued (A)

Project participants

• Sangyun Jung
• Steve Duckworth
• Jinseog Kim

Call for public input

From 25 Mar 2010 (00:00:00 GMT) till 17 Apr 2010 (23:59:59 GMT).

Desk review(s)

There are no desk reviews.

Output of subsequent Panel meetings

Meth Panel 51	Draft reformatted methodology (410 KB) Final recommendation (38 KB) Summary recommendation (184 KB)
Meth Panel 50	Work in progress: see para 8 (a) of MP50: 8. The panel requested the Board to take note that it could not conclude its consideration of the following proposed new methodologies: (a) NM0332 ìPFCs emission reduction from installation of an abatement device in a semiconductor manufacturing facilityî, as further work is needed on issues concerning: (i) by-product emissions from the abatement system; (ii) calculation of project emissions; and (iii) presentation of algorithms
Meth Panel 49	Work in progress: MP49, para 10 (b) (b) NM0332 ìPFCs emission reduction from installation of an abatement device in a semiconductor manufacturing facilityî, due to the high workload. The panel will continue its consideration of the proposed new methodology at its next meeting;
Meth Panel 48	Preliminary recommendation (460 KB) Feedback to preliminary recommendation (322 KB)

Output of subsequent EB meetings

EB 63	A (511 KB)