NM0317: Substitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industry

Initial submission

Reference NM0317
Title Substitution of Fluorinated Compound (FC) gases for cleaning Chemical Vapor Deposition (CVD) reactors in the semiconductor industry
Submitted by SGS on 15 Jun 09
Documents
Current status 07 Dec 09 - Submission not approved
Historic statuses 15 Jun 09 - Submission received
 02 Jul 09 - Successfully passed the Completeness Check
 02 Jul 09 - Undergoing Assessment by the Secretariat
 24 Jul 09 - Submission deemed qualified
 24 Jul 09 - Undergoing desk reviews by experts
 29 Jul 09 - Opened for public comments
 19 Aug 09 - Closed for public comments
 19 Aug 09 - Desk reviews completed by experts
 19 Aug 09 - Awaiting the Meth Panel recommendation
 25 Sep 09 - Awaiting Project Participant feedback on the preliminary recommendation
 12 Oct 09 - Clarifications received from project participants
 02 Nov 09 - Meth Panel recommendation issued (C)

Call for public input

From 29 Jul 2009 (00:00:00 GMT) till 18 Aug 2009 (23:59:59 GMT).

Desk review(s)

Meth Panel recommendation and communication

Meth Panel 40
14 Sep 09
Meth Panel 41
19 Oct 09

EB decision

C (152 KB)